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Cielution thermal modeling

Tips on Modeling Warpage for 3D ICs

This week’s webinar on chip stack assembly simulation, presented by Kamal Karimanal of Cielution offered some useful information on how modeling can be used to minimize warpage in 3D stacking. In 3D stacking, versus traditional flip chip processes, thickness of RDL layers in comparison with the thinned die or wafer can lead...

An Incomplete List of 3D Solutions

We read a lot about the remaining challenges to be addressed before 3D ICs are fully commercialized. Current roadmaps are now targeting 2015 for commercialization of 3D ICs, while 2.5D gets the ball rolling towards the end of 2012, beginning of 2013. Reports from Xilinx indicate they are shipping 2.5D...

EV Group Unveils Its Next-Generation EVG150 Automated Resist Processing Platform for High-Volume Coating/Developing Applications

Redesigned, Fully Automated Modular System Integrates Unmatched Spray Coating Processes for MEMS, Compound Semiconductors and Advanced Packaging SEMICON TAIWAN, Taipei, September 4, 2012 - EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today unveiled its next-generation EVG150 automated resist...

Ziptronix Takes on 3D Memory

After seeing the latest press release on Ziptronix foray into the memory space, I sought out Kathy Cook, business development manager at Ziptronix, at ECTC to get the full story.  We’ve been reading and hearing a lot about Ziptronix ZiBond process being used in CMOS image sensor (BSI) technology, and particularly...

CEA-Leti: The Mother Ship Re-visted

Last time I visited Leti on the Minatec Campus was in October 2009.  Recently, when I was back for Leti’s Annual Research Reviews, Mark Scannell, head of the 3D integration program, took me on another tour. A lot has been going on here in the past 2 years. For one...

3D R&D Round-up: Part 1: RTI International

At last month’s 3D Architectures for Semiconductor Integration and Packaging Conference, coordinated by RTI International, three government-funded research institutes – RTI, CEA-Leti, and MIT Lincoln Laboratories reported on the status of their progress in the 3D integration space.

Trends and challenges for thin wafer processing

Processes addressing the handling of ultra-thin wafers have been a hot topic ever since it became clear that they are vital to a multitude of semiconductor applications such as MEMS, compound semiconductors, LEDs, fan-out WLP, CMOS image sensors (CIS) and most recently, 3D IC using TSV interconnects.