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Updates in Test Connectivity System (TCS) from TestConX

The annual TestConX conference (www.testconx.org) was held March 5-8, 2023, in Mesa, Arizona. It offered a one-of-a-kind, one-stop shop for the latest information coming from the Test Connectivity eco-system (TCS) consisting of probe cards, test and burn-in sockets, and load boards. There were 80 exhibitors and presentations/tutorials across 4 days....

New Multi-Functional Micro- and Nanoimprint Solution from EV Group Offers Unprecedented Flexibility for High-Volume Optical Device Manufacturing

ST. FLORIAN, Austria, January 18, 2022—EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today introduced the EVG®7300 automated SmartNIL® nanoimprint and wafer-level optics system. The EVG7300 is the company’s most advanced solution to combine multiple UV-based process capabilities, such...

New Details About More-than-Moore Test Technology Advances

SEMICON West and the Electronic System (ES) Design West were, for the first time, co-located at the Moscone Center in San Francisco, from July 9 to 11, 2019. In addition to most keynotes, I reported about here, This blog talks about some in-depth technical presentations on test and the progress...

Breakthroughs in 3D Stacked FinFETS and 3D Sequential Integration

The annual International Electron Devices Meeting (IEDM) presents the latest developments in electronic device technologies focused on advanced scaling, heterogeneous integration, quantum computing, and wide bandgap devices. Among several excellent papers on 3D integration were two papers on 3D sequential integration, long the holy grail of 3D integration because of...

Hybrid Bonding: From Concept to Commercialization

Hybrid bonding is quickly becoming recognized as the preferred permanent bonding path for forming high-density interconnects in heterogeneous integration applications, from 2DS enhanced, to 3D stacking with or without through silicon vias (TSVs), as well as MEMS and III-V applications. In this exclusive interview with Gill Fountain, Xperi, winner of...

The X-ray Metrology of TSVs and Wafer Bumps

Being able to look inside an object without opening it up or destroying it, and separating the different features within that would otherwise overlap each other when seen in a standard 2D X-ray image, are the same for the needs of electronics inspection on wafers and on printed circuit boards,...

2.5D and 3D IC Technologies: Application Ready but Cost Limited?

Two schools of thought clearly emerged at last week’s European 3D TSV Summit, which took place on January 20 and 21, 2014 at Minatec campus in Grenoble France. One I addressed in yesterday’s post – about realizing system-level benefits – including cost – by integrating 2.5D and 3D IC technologies....

What is 3D Integration?

In the world of semiconductors and microelectronics, a trend to vertically stack integrated circuits (ICs) or circuitry has emerged as a viable solution for meeting electronic device requirements such as higher performance, increased functionality, lower power consumption, and a smaller footprint. The various methods and processes used to achieve this...