Garching/Germany, August 18, 2015 – SUSS MicroTec, a global supplier of equipment and process solutions for the semiconductor industry and related markets, and the Singh Center for Nanotechnology at the University of Pennsylvania (Penn) are announcing a cooperation agreement in the field of nanoimprint technologies. As part of this cooperation, Penn has recently received the equipment set and the technology know-how for Substrate Conformal Imprint Lithography (SCIL), that will expand the capabilities of the recently installed MA/BA6 Gen3 Mask Aligner from SUSS MicroTec at Penn.
Substrate Conformal Imprint Lithography (SCIL) is a nanoimprint technique combining the advantages of both soft and rigid stamps, allowing large-area patterning and sub-50nm resolution to be achieved at the same time. SCIL is applied in diverse fields, ranging from HB LEDs, Photovoltaics, MEMS, NEMS and mass production of optical gratings for gas sensing and telecommunications.
The Singh Center for Nanotechnology will implement SCIL for use in plasmonic devices, semiconductor nanowires, flexible nanocrystal electronics, biodegradable sensors and MEMS batteries. In addition, Lithography Manager Dr. Gerald Lopez will lead the Center’s efforts in qualifying new nanoimprint materials and related process technology development in close cooperation with SUSS MicroTec.
As a further important part of the cooperation, SUSS MicroTec`s customers will gain direct access to the cleanroom facilities and the equipment set installed at Penn, serving as a demonstration center for North American customers. The experience and high technology level of Penn allows the customer to see the entire process flow, the imprinting process itself and the subsequent steps up to a finished device.
“We are pleased to collaborate with SUSS MicroTec for developing applications with SCIL. By combining our strengths in micro- and nanofabrication, we are able to provide superior nanoimprint capabilities to our researchers,” stated Professor Mark Allen, Scientific Director of the Singh Center for Nanotechnology and Alfred Fitler Moore, Professor of Electrical and Systems Engineering. “This industrial partnership enhances our ability to demonstrate how nanoimprint technology serves as a catalyst in research and its translation into the commercial sector.”
“We are very happy about the cooperation with the Singh Center for Nanotechnology. Their work will contribute strongly to further commercialize this large area nano-patterning technique in order to accelerate the adoption for volume production. In addition, our customers do not just benefit from the possibility to use Penn’s facilities and get insights to the entire imprinting process, but also from Penn´s knowledge, by having an experienced partner at hand,” says Ralph Zoberbier, General Manager Exposure and Laser Processing of SUSS MicroTec.
